1.5 µm process

The 1.5 μm process is the level of MOSFET semiconductor process technology that was reached around 1981–1982, by leading semiconductor companies such as NEC, Intel and IBM.

Products featuring 1.5 μm manufacturing process

NEC's 64 kbit SRAM memory chip introduced the 1.5 μm process in 1981.[1]
Intel 80286 CPU launched in 1982 was manufactured using this process.[2]
Intel introduced a 64 kbit DRAM memory chip using a 1.5 μm CMOS process in 1983.[3]
The Amiga Advanced Graphics Architecture (initially sold in 1992) included chips such as Denise that were manufactured using a 1.5 μm CMOS process.[4]

References

"Memory". STOL (Semiconductor Technology Online). Retrieved 25 June 2019.
"History of the Intel Microprocessor - Listoid". Archived from the original on 2015-04-27. Retrieved 2015-04-19.
Gealow, Jeffrey Carl (10 August 1990). "Impact of Processing Technology on DRAM Sense Amplifier Design" (PDF). CORE. Massachusetts Institute of Technology. pp. 149–166. Retrieved 25 June 2019.
"Amiga Manual: Amiga 3000+ System Specification 1991".

External links

Brief timeline of microprocessor development

Preceded by 3 μm process	MOSFET semiconductor device fabrication process	Succeeded by 1 μm process

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[stol-1] "Memory". STOL (Semiconductor Technology Online). Retrieved 25 June 2019.

[2] "History of the Intel Microprocessor - Listoid". Archived from the original on 2015-04-27. Retrieved 2015-04-19.

[Gealow-3] Gealow, Jeffrey Carl (10 August 1990). "Impact of Processing Technology on DRAM Sense Amplifier Design" (PDF). CORE. Massachusetts Institute of Technology. pp. 149–166. Retrieved 25 June 2019.

[4] "Amiga Manual: Amiga 3000+ System Specification 1991".

Semiconductor device fabrication

MOSFET scaling (process nodes)
010 µm – 1971 006 µm – 1974 003 µm – 1977 1.5 µm – 1981 001 µm – 1984 800 nm – 1987 600 nm – 1990 350 nm – 1993 250 nm – 1996 180 nm – 1999 130 nm – 2001 090 nm – 2003 065 nm – 2005 045 nm – 2007 032 nm – 2009 022 nm – 2012 014 nm – 2014 010 nm – 2016 007 nm – 2018
Future 005 nm – ~2020 003 nm – ~2022
Half-nodes Density CMOS Device (multi-gate) Moore's law Semiconductor Nanoelectronics