Titanium disilicide

Titanium disilicide^[1]
Names
	IUPAC name Titanium disilicide
	Other names Titanium silicide
Identifiers
CAS Number	12039-83-7 ;
3D model (JSmol)	Interactive image;
ECHA InfoCard	100.031.719
PubChem CID	6336889;
	InChI InChI=1S/2Si.Ti;
	SMILES [Si]=[Ti]=[Si];
Properties
Chemical formula	TiSi2
Molar mass	104.038 g/mol
Appearance	black orthorhombic crystals
Density	4.02 g/cm3
Melting point	1,470 °C (2,680 °F; 1,740 K)
Solubility in water	insoluble
Solubility	soluble in HF
Related compounds
Other cations	Zirconium disilicide; Hafnium disilicide
	Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
	verify (what is ?)
	Infobox references

Titanium disilicide (Ti Si₂) is an inorganic chemical compound.

Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.

References

↑ Lide, David R. (1998), Handbook of Chemistry and Physics (87 ed.), Boca Raton, Florida: CRC Press, pp. 4–91, ISBN 0-8493-0594-2

This article is issued from Wikipedia. The text is licensed under Creative Commons - Attribution - Sharealike. Additional terms may apply for the media files.

[hand-1] Lide, David R. (1998), Handbook of Chemistry and Physics (87 ed.), Boca Raton, Florida: CRC Press, pp. 4–91, ISBN 0-8493-0594-2