Metal assisted chemical etching

Metal Assisted Chemical Etching (also known as MACE) is the process of wet chemical etching of semiconductors (mainly silicon) with the use of a metal catalyst, usually deposited on the surface of a semiconductor in the form of a thin film. Both noble metals such as gold[1], platinum[2], palladium[3], and silver[4] and base metals such as iron[5], nickel[6][7], and copper[8] can act as a catalyst in the process.

Applications of MACE

Porous silicon

Metal assisted chemical etching allows for the production of porous silicon with photoluminescence.[9]

Black silicon

Black silicon is silicon with a modified surface and is a type of porous silicon. There are several works on obtaining black silicon using MACE technology. The main application of black silicon is solar energy.[6][7]

References
  1. Mikhael, Bechelany, et al. "New silicon architectures by gold-assisted chemical etching." ACS applied materials & interfaces 3.10 (2011): 3866-3873.
  2. Tsujino, Kazuya, and Michio Matsumura. "Helical nanoholes bored in silicon by wet chemical etching using platinum nanoparticles as catalyst." Electrochemical and Solid-State Letters 8.12 (2005): C193-C195.
  3. Chen, Jun-Ming, et al. "Inherent formation of porous p-type Si nanowires using palladium-assisted chemical etching." Applied Surface Science 392 (2017): 498-502.
  4. Lee, Jung-In, and Soojin Park. "High-performance porous silicon monoxide anodes synthesized via metal-assisted chemical etching." Nano Energy 2.1 (2013): 146-152.
  5. Loni, A., et al. "Extremely high surface area metallurgical-grade porous silicon powder prepared by metal-assisted etching." Electrochemical and Solid-State Letters 14.5 (2011): K25-K27.
  6. Volovlikova, Olga V., et al. "Influence of Etching Regimes on the Reflectance of Black Silicon Films Formed by Ni-Assisted Chemical Etching." Key Engineering Materials. Vol. 806. Trans Tech Publications Ltd, 2019.
  7. Azeredo, B. P., et al. "Silicon nanowires with controlled sidewall profile and roughness fabricated by thin-film dewetting and metal-assisted chemical etching." Nanotechnology 24.22 (2013): 225305.
  8. Qiu, Teng, and Paul K. Chu. "Self-selective electroless plating: An approach for fabrication of functional 1D nanomaterials." Materials Science and Engineering: R: Reports 61.1-6 (2008): 59-77.
  9. Li, Xiuling, and P. W. Bohn. "Metal-assisted chemical etching in HF/H 2 O 2 produces porous silicon." Applied Physics Letters 77.16 (2000): 2572-2574.
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